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Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric
,
A. C. Kozen
,
M. A. Schroeder
,
K. D. Osborn
,
C. J. Lobb
, and
G. W. Rubloff
,
Appl. Phys. Lett.
,
102
(2013)
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