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Moore’s Law and the Physics of Manufacturing Nanoscale Devices

October 10, 2017 - 4:00pm
Speaker: 
Charles Tarrio
Institution: 
NIST Gaithersburg

Over 50 years ago, Gordon Moore postulated that the number of devices in an integrated circuit would double roughly every 1.5-2 years. Lithography is the technology used to keep this up for the last 50 years. Lithography has gone through several iterations, and is currently going through a paradigm shift from deep ultraviolet with a wavelength of 193 nm, to extreme ultraviolet (EUV) with a wavelength of 13.5 nm. The transition to such a short wavelength has presented many scientific and technological challenges. I'll discuss the history of semiconductor lithography and how potential "showstoppers" in the EUV have been overcome.

Hosted by Howard Milchberg

PSC Lobby
College Park, MD 20742